发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE THEREOF
摘要 A large DRAM (dynamic random-access memory) uses rather low cell read voltage, and its operation is likely to be unstable. If the memory cell is designed for a gain to amplifying signal voltage, then the memory cell area increases. Therefore, there is a need for a RAM with small-area memory cells capable of stabilized operation. A semiconductor device according to this invention comprises a three-dimensional cell structure that includes MOS transistors (2, 3, 4, 5) for reading information, transistors (8, 11b) for writing information, and a capacitor (11a) for controlling the voltage at storage nodes.
申请公布号 WO0055906(A1) 申请公布日期 2000.09.21
申请号 WO2000JP01094 申请日期 2000.02.25
申请人 HITACHI, LTD.;NAKAZATO, KAZUO;ITO, KIYOO 发明人 NAKAZATO, KAZUO;ITO, KIYOO
分类号 H01L21/8242;H01L27/108;(IPC1-7):H01L21/824;G11C11/401 主分类号 H01L21/8242
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