发明名称 |
Non-volatile semiconductor memory device and fabrication method thereof |
摘要 |
A non-volatile semiconductor memory device is provided with a circuit that protects a tunnel oxide film from the charging phenomenon. This circuit comprises a first junction diode including an N+-type diffusion layer and a P-type well, and a second junction diode including a P-type well and an N-type well. When a voltage applied to the control gate is greater than all of a write voltage, a read voltage, and an erasure voltage that would be applied to the control gate, a current is guided through that circuit.
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申请公布号 |
US6122192(A) |
申请公布日期 |
2000.09.19 |
申请号 |
US19990250303 |
申请日期 |
1999.02.16 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
FURUHATA, TOMOYUKI;KATO, KOJI |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C13/00 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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