| 发明名称 |
Compound for the aluminum film from chemical vapor depositions and the method of synthesis |
| 摘要 |
Organometallic precursor compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic precursor compounds and methods of forming aluminum films.
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| 申请公布号 |
US6121443(A) |
申请公布日期 |
2000.09.19 |
| 申请号 |
US19990283317 |
申请日期 |
1999.03.31 |
| 申请人 |
ROHM AND HAAS COMPANY |
发明人 |
SHIN, HYUN-KOOCK |
| 分类号 |
C07F5/06;C23C16/20;(IPC1-7):C07D207/00;C07D333/46;B05D5/12 |
主分类号 |
C07F5/06 |
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