| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas deposition device and method capable of optionally stopping or starting the spraying of hyper-fine particles from a nozzle, thereby capable of optionally forming a deposition film of the hyper-fine particles, and moreover, improved in the using efficiency of a hyper-fine particle material by utilizing the hyper-fine particles stored in a hyper-fine particle exhausting chamber. SOLUTION: A gas deposition device has a mechanism of optionally executing the start or stop of the carrying of hyper-fine particles inhaled into an inhaling tube 1 to a carrying tube 3, where the mechanism of optionally executing the start or stop of the carrying of the hyper-fine particles to the carrying tube is, e.g. a carrying switching mechanism of optionally selecting a carrying tube or an exhausting tube for exhausting the hyper-fine particles.
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