发明名称 Latch-up free power MOS-bipolar transistor
摘要 A MOS bipolar transistor is provide which includes a silicon carbide npn bipolar transistor formed on a bulk single crystal n-type silicon carbide substrate and having an n-type drift layer a p-type base layer. Preferably the base layer is formed by epitaxial growth and formed as a mesa. A silicon carbide nMOSFET is formed adjacent the npn bipolar transistor such that a voltage applied to the gate of the nMOSFET causes the npn bipolar transistor to enter a conductive state. The nMOSFET has a source and a drain formed so as to provide base current to the npn bipolar transistor when the bipolar transistor is in a conductive state. Also included are means for converting electron current flowing between the source and the drain into hole current for injection into the p-type base layer. Means for reducing field crowding associated with an insulating layer of said nMOSFET may also be provided.
申请公布号 US6121633(A) 申请公布日期 2000.09.19
申请号 US19980082554 申请日期 1998.05.21
申请人 CREE RESEARCH, INC. 发明人 SINGH, RANBIR;PALMOUR, JOHN W.
分类号 H01L21/331;H01L29/12;H01L29/24;H01L29/73;H01L29/78;(IPC1-7):H01L31/031 主分类号 H01L21/331
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