发明名称 Methods of forming field effect transistors and field effect transistor circuitry
摘要 Methods of forming field effect transistors and resultant field effect transistor circuitry are described. In one embodiment, a semiconductive substrate includes a field effect transistor having a body. A first resistive element is received by the substrate and connected between the transistor's gate and the body. A second resistive element is received by the substrate and connected between the body and a reference voltage node. The first and second resistive elements form a voltage divider which is configured to selectively change threshold voltages of the field effect transistor with state changes in the gate voltage. In a preferred embodiment, first and second diode assemblies are positioned over the substrate and connected between the gate and body, and the body and a reference voltage node to provide the voltage divider.
申请公布号 US6121665(A) 申请公布日期 2000.09.19
申请号 US19990266710 申请日期 1999.03.11
申请人 MICRON TECHNOLOGY, INC. 发明人 GONZALEZ, FERNANDO;MOULI, CHANDRA
分类号 H01L27/07;(IPC1-7):H01L29/786;H01L29/49 主分类号 H01L27/07
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