发明名称 |
Reduction of mobile ion and metal contamination in HDP-CVD chambers using chamber seasoning film depositions |
摘要 |
A method and apparatus for controlling the introduction of contaminates into a deposition chamber that occur naturally within the chamber components. The CVD chamber is "seasoned" with a protective layer after a dry clean operation and before a substrate is introduced into the chamber. The deposited seasoning layer has a lower diffusion rate for typical contaminants in relation to the chamber component materials and covers the chamber component, reducing the likelihood that the naturally occurring contaminants will interfere with subsequent processing steps. After deposition of the seasoning layer is complete, the chamber is used for one to n substrate deposition steps before being cleaned by another clean operation as described above and then reseasoned.
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申请公布号 |
US6121161(A) |
申请公布日期 |
2000.09.19 |
申请号 |
US19990233366 |
申请日期 |
1999.01.19 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ROSSMAN, KENT;SAHIN, TURGUT;M'SAAD, HICHEM;NOWAK, ROMUALD |
分类号 |
C23C14/56;C23C16/44;C23C16/50;H01L21/205;(IPC1-7):H01L21/31 |
主分类号 |
C23C14/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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