发明名称 GAS TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a gas treating device by which gas treatment can be effectively made without feeding ozonized air and water in mist into a treating chamber by a compressor. SOLUTION: A gas treating device 30 is provided with a treating vessel 1 having a gas suction port 7 into which gas to be treated is introduced and ozone introducing means 3, 4 for introducing ozone into the treating vessel 1 or an ozonizer for generating ozone in the treating vessel. The water feeding means 2 feeds moisture into the treating vessel 1. In the treating vessel 1, adsorbent or absorbent 15 is arranged opposite to the gas suction port 7.
申请公布号 JP2000254441(A) 申请公布日期 2000.09.19
申请号 JP19990063927 申请日期 1999.03.10
申请人 TOSHIBA CORP 发明人 SUZUKI SETSUO;OHASHI YUKIO;KAWACHI TAKANORI;HAYASHI KOJI
分类号 B01D53/34;B01D53/38;B01D53/74;B01D53/86 主分类号 B01D53/34
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