发明名称 QUARTZ GLASS AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To provide quartz glass which is used as a lens material for the image formation optical system of ultraviolet laser for excimer laser lithography or the like, and to provide a method for producing the same. SOLUTION: In quartz glass synthesized by the direct method using raw materials comprising organosilicon compounds, the quartz glass having an internal absorption coefficient of <=0.001 cm-1 in the wavelength region of >=190 nm is obtained by suppressing the concentration of formyl radicals formed in the inside of the quartz glass by X-ray irradiation to be not more than 2×1014 radical/cm3.
申请公布号 JP2000256019(A) 申请公布日期 2000.09.19
申请号 JP19990063258 申请日期 1999.03.10
申请人 NIKON CORP 发明人 KOMINE NORIO;FUJIWARA MASASHI;YOSHIDA AKIKO;JINBO HIROKI
分类号 C03B8/04;C03B20/00;C03C3/06;C03C4/00;(IPC1-7):C03B8/04 主分类号 C03B8/04
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