发明名称 |
QUARTZ GLASS AND ITS PRODUCTION |
摘要 |
PROBLEM TO BE SOLVED: To provide quartz glass which is used as a lens material for the image formation optical system of ultraviolet laser for excimer laser lithography or the like, and to provide a method for producing the same. SOLUTION: In quartz glass synthesized by the direct method using raw materials comprising organosilicon compounds, the quartz glass having an internal absorption coefficient of <=0.001 cm-1 in the wavelength region of >=190 nm is obtained by suppressing the concentration of formyl radicals formed in the inside of the quartz glass by X-ray irradiation to be not more than 2×1014 radical/cm3.
|
申请公布号 |
JP2000256019(A) |
申请公布日期 |
2000.09.19 |
申请号 |
JP19990063258 |
申请日期 |
1999.03.10 |
申请人 |
NIKON CORP |
发明人 |
KOMINE NORIO;FUJIWARA MASASHI;YOSHIDA AKIKO;JINBO HIROKI |
分类号 |
C03B8/04;C03B20/00;C03C3/06;C03C4/00;(IPC1-7):C03B8/04 |
主分类号 |
C03B8/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|