| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas deposition device and method stabilizing the gas flow of hyper-fine particles evaporated from an evaporating source and stable in the deposition rate. SOLUTION: A gas deposition device is composed of a hyper-fine particle producing chamber provided with an evaporating source 4 and the opening part 2 of a carrying tube 1 in the upper part of the evaporating source and a film forming chamber provided with a nozzle jointed to the other opening part of the carrying tube and a stage for fixing a substrate arranged oppositely thereto, hyper-fined particles evaporated from the evaporating source and carried into the carrying tube together with gas introduced into the hyper-fine particle producing chamber, and the hyper-fine particles sprayed from the nozzle are deposited on the substrate to form a film. The opening part of the carrying tube is provided with a mechanism of collecting the hyper-fine particles evaporated from the evaporating source.
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