发明名称 MAGNET ATTRACTION TYPE DIPPING DEVICE FOR LIQUID TREATMENT WORK
摘要 PROBLEM TO BE SOLVED: To provide a magnet attraction type dipping device for liquid treatment works allowing stable carriage without causing swing of the works that are targets for liquid treatment, and capable of certainly performing a series of the liquid treatment. SOLUTION: This dipping device has a liquid treatment line L comprising plural treatment baths T1, T2,... each stored with a required treatment liquid; and a carrier C for sequentially dipping works W into the respective treatment baths T1, T2,..., and pulling up and carrying the works W along the liquid treatment line L. The carrier C includes an advance and retreat motion mechanism allowing advance and retreat motion along the liquid treatment line L; brackets 2 brought out above the treatment baths T1, T2,<; an elevating post movable up and down with supporting the brackets 2; and magnets provided in the bringing out parts of the brackets 2 and capable of flatly attracting and suspending suspension hangers of the works W dipped into the treatment baths T1, T2,....
申请公布号 JP2000255771(A) 申请公布日期 2000.09.19
申请号 JP19990060672 申请日期 1999.03.08
申请人 JPC KK 发明人 BANBA SADAO
分类号 B05C3/00;B05C13/02;B65G49/04;(IPC1-7):B65G49/04 主分类号 B05C3/00
代理机构 代理人
主权项
地址