发明名称 MULTILAYER SEMICONDUCTOR CERAMIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a multilayer semiconductor ceramic device which can be calcined at <=1000 deg.C and which can develop enough PTC characteristics even when the device is subjected to re-oxidation treatment at a low temp. SOLUTION: This multilayer semiconductor ceramic device 1 consists of a multilayer sintered body 3 in which semiconductor ceramic layers 5 and inner electrode layers 7 are alternately stacked, and outer electrodes 9 formed on the sintered body 3. The semiconductor ceramic layers 5 contain at least boron oxide and an oxide comprising at least one kind selected from barium, strontium, calcium, lead, yttrium and rare earth elements in a barium titanate-based semiconductor sintered body. These oxides are incorporated in such a manner that the atomic ratio of the boron element (B) in the boron oxide satisfies 0.001<=B/&beta;<=0.50 and 0.5<=B/(&alpha;-&beta;)<=10.0, wherein &alpha; is the total amt. of barium, strontium, calcium, lead, yttrium and rare earth elements in the semiconductor ceramic material, and &beta; is the total amt. of titanium, tin, zirconium, niobium, tungsten and antimony in the semiconductor ceramic material.
申请公布号 JP2000256062(A) 申请公布日期 2000.09.19
申请号 JP19990058444 申请日期 1999.03.05
申请人 MURATA MFG CO LTD 发明人 NIIMI HIDEAKI;MATSUNAGA TATSUYA
分类号 C04B35/46;C04B35/468;H01C7/02 主分类号 C04B35/46
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