| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin which gives a composition having a good developability, a high heat resistance, and excellent heat resistance and electrical insulation reliability after moisture absorption by reacting a polybasic acid anhydride with a reaction product of an epoxy acrylate with a cyanic ester compound. SOLUTION: The epoxy acrylate is a reaction product of an epoxy resin with acrylic acid, and an epoxy acrylate of bisphenol A type is suitable, The cyanic ester compound is a compound having one or more, usually 5 or lower, cyanate groups and preferably is an aromatic organic compound having 2-5 cyanate groups directly bonded to an aromatic ring, Usually, 5-40 pts.wt. cyanic ester compound and 10-90 pts.wt. polybasic acid are used based on 100 pts.wt. epoxy acrylate, The photosensitive resin is compounded with an epoxy resin to give the photosensitive resin composition. |
