发明名称 Semiconductor processing system
摘要 A semiconductor processing system includes a semiconductor processing chamber, a heat source assembly and a window. The window is located over an opening into a main body of the chamber. The heat source assembly is evacuable to alter the pressure differential across the window.
申请公布号 US6121581(A) 申请公布日期 2000.09.19
申请号 US19990350801 申请日期 1999.07.09
申请人 APPLIED MATERIALS, INC. 发明人 HEGEDUS, ANDREAS G.
分类号 H01L21/302;C23C16/48;C30B25/10;H01L21/00;H01L21/205;H01L21/26;H01L21/3065;H01L21/324;(IPC1-7):F27B5/14 主分类号 H01L21/302
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