发明名称 TREATING DEVICE AND TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To prevent deposition of foreign matter on the treated object from being caused e.g. when a treated object is withdrawn from the treating liquid by discharging the foreign matter floating on the liquid surface of the treating liquid from a treatment vessel. SOLUTION: This treatment method using this treating device involves causing difference in surface tension within a liquid surface 13 of a treating liquid by a surface-tension nonuniformization means such as means for supplying a surface-active fluid 90 to the liquid surface 13, to effect a flow of the treating liquid due to the difference in surface tension and thereby to efficiently discharge floating foreign matter 80 from the treating device by a discharge means such as overflow section 17. As a result, the liquid surface 13 of the treating liquid, including a part of the liquid surface 13, which part is located above an object 200 being treated and conventionally liable to become stagnant, can always be maintained in a normal state and deposition of the foreign matter 80 on the treated object 200 can be prevented from being caused.
申请公布号 JP2000254603(A) 申请公布日期 2000.09.19
申请号 JP19990058347 申请日期 1999.03.05
申请人 MITSUBISHI ELECTRIC CORP 发明人 ISHIKAWA HIROAKI;KOTO SATORU;FUJINO NAOHIKO;TANAKA HIROSHI
分类号 B08B3/08;H01L21/304;(IPC1-7):B08B3/08 主分类号 B08B3/08
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