发明名称 |
Pattern forming material and pattern forming method |
摘要 |
A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: wherein R1 indicates a hydrogen atom or an alkyl group; R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; R4 indicates a hydrogen atom or an alkyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.
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申请公布号 |
US6120974(A) |
申请公布日期 |
2000.09.19 |
申请号 |
US19990326541 |
申请日期 |
1999.06.07 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
MATSUO, TAKAHIRO;ENDO, MASAYUKI;SHIRAI, MASAMITSU;TSUNOOKA, MASAHIRO |
分类号 |
G03F7/004;G03F7/039;G03F7/26;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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