发明名称 |
Direct phase shift measurement between interference patterns using aerial image measurement tool |
摘要 |
A method of measuring the phase shift between two regions of a phase shift mask. A workpiece is provided including a first pair of slits each having a substantially similar phase shift characteristic and a second pair of slits each having a different phase shift characteristic. Electromagnetic radiation is directed through the first pair of slits and the second pair of slits on the workpiece. A relative shift is measured between interference patterns caused by the first pair of slits and the second pair of slits.
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申请公布号 |
US6122056(A) |
申请公布日期 |
2000.09.19 |
申请号 |
US19980056521 |
申请日期 |
1998.04.07 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HIBBS, MICHAEL STRAIGHT;PENG, SONG |
分类号 |
H01L21/027;G03F1/00;G03F1/08;(IPC1-7):G01B9/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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