发明名称 |
RETICLE THAT COMPENSATES FOR LENS ERROR IN PHOTOLITHOGRAPHIC SYSTEM |
摘要 |
PURPOSE: A reticle (130) which gives an image pattern and compensates for a lens error in a photolithographic system is provided, to improve the accuracy of photolithographic systems such as step and repeat systems. CONSTITUTION: A reticle is structurally modified using image displacement data indicative of the lens error. The reticle can be structurally modified by adjusting the configuration (or layout) of radiation-transmitting regions (132,134) for instance by adjusting a chrome pattern on the top surface of a quartz base. Alternatively, the reticle can be structurally modified by adjusting the curvature of the reticle, for instance by providing a chrome pattern on the top surface of a quartz base and grinding away portions of the bottom surface of the quartz base. The image displacement data can also vary as a function of lens heating so that the reticle compensates for lens heating associated with the reticle pattern. |
申请公布号 |
KR20000057416(A) |
申请公布日期 |
2000.09.15 |
申请号 |
KR19997004987 |
申请日期 |
1999.06.04 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
MOORE BRADLEY T.;DAWSON ROBERT;FULFORD H. JIM;GARDNER MARK I.;HAUSE FREDERICK N.;MICHAEL MARK W.;WRISTERS DERICK J. |
分类号 |
G03F1/00;G03F7/20;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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