发明名称 |
PROCESS FILM, PROCESS INK, AND PLATEMAKING METHOD AND SYSTEM USING THE FILM |
摘要 |
<p>PURPOSE: A process film, process ink, and platemaking method and system using the film are provided, to obtain a high-quality photomask for platemaking having high resolution at a low cost. CONSTITUTION: A process film comprises a transparent substrate and, formed thereon, a layer consisting mainly of a polymer comprising repeating units represented by the following general formula (1) wherein A represents formula (I) where x, y, and z are each an integer of 1 or larger and Y represents a hydrocarbon group having one or more carbon atoms; X represents a residue of an organic compound having two active hydrogen atoms; and R1 represents a residue of a dicarboxylic acid or diisocyanate compound. An image is formed on this film preferably by ink-jet recording using a process ink which contains a yellow dye absorbing an ultraviolet in a wavelength range of 350 to 450 nm, preferably a mono- or disazo dye.</p> |
申请公布号 |
KR20000057291(A) |
申请公布日期 |
2000.09.15 |
申请号 |
KR19997004701 |
申请日期 |
1999.05.28 |
申请人 |
MITSUBISHI PLASTICS, INC. |
发明人 |
KAKISHITA OSAMU;NISHIOKA JUN;NISHIMURA SHIGEKI;KUZUKAWA KAZUO |
分类号 |
B41M5/00;B41M5/52;C09B29/01;C09D11/00;G03F1/00;(IPC1-7):B41M5/00 |
主分类号 |
B41M5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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