APPARATUS AND METHOD FOR CALCULATING ERROR AMOUNT OF EXPOSURE EQUIPMENT

摘要

PURPOSE: An apparatus and method for calculating an error amount of an exposure equipment is to define and correct a distortion aberration when a pattern on a mask is exposed to light on a corresponding substrate. CONSTITUTION: An apparatus for calculating an error amount of an exposure equipment comprises: a coordinate value measuring part(1) for calculating coordinate values corresponding to a directed position of a pattern formed on a mask and a directed position of an exposed pattern on a substrate and outputting the calculated coordinate values; and an error occurrence amount calculating part(2) for reading the coordinate values output from the coordinate value measuring part, calculating respective error amounts of a non-linear conversion function and a linear function using the least square method and performing an error correction for the calculated non-linear conversion function and the linear function.