APPARATUS FOR MANUFACTURING SEMICONDUCTOR HAVING HEATER FOR HEATING CHAMBER

摘要

PURPOSE: An apparatus for manufacturing a semiconductor having a heater for heating a chamber is provided to form a thin film having a uniform thickness on a wafer, by partially controlling heat applied to the chamber according to the thickness of the thin film formed on the wafer. CONSTITUTION: An apparatus for manufacturing a semiconductor having a heater(300) for heating a chamber comprises the chamber, a gas-supplying element, a first heater, and a second heater. The chamber forms a predetermined film on a wafer. The gas-supplying element supplies a predetermined gas to the chamber from the exterior. The first heater heats a portion to which the gas supplying element of the chamber is connected. The second heater heats a rear portion of the portion heated by the first heater. The respective heaters include a plurality of coils for transforming at least one voltage to a heat.