| 摘要 |
PURPOSE: A method for manufacturing a thin film actuated mirror array is to prevent a crack from being generated at a deformation layer in an etching process, and the deformation layer from being etched by hydrogen fluoride vapor. CONSTITUTION: An active matrix(100) has an MxN transistor installed therein, and a drain pad formed on one side thereof. The first layer is formed on the active matrix. A lower electrode layer is formed and patterned on the first layer, thereby forming a lower electrode(140). An insulating line(145) is formed by performing an O2 ion implantation along the interface line of the lower electrode and an Iso-Cut part among the lower electrodes. The second layer is formed and patterned on the lower electrode and the insulating line, thereby forming a deformation layer(150). An upper electrode layer is deposited and patterned on the deformation layer, thereby forming an upper electrode(155). A support layer(135) is formed by patterning the first layer. A mirror(175) is formed on the support layer.
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