发明名称 SYSTEM FOR MEASURING MAGNETIC FIELD OF REACTION CHAMBER
摘要 PURPOSE: A system for measuring a magnetic field of a reaction chamber is provided to precisely detect the magnetic field of the reaction chamber and to perform a precise calibration, by having a sensor for detecting the magnetic field fixed by a cover for fixing the sensor. CONSTITUTION: A system for measuring a magnetic field of a reaction chamber(10) comprises a sensor(23), a wire(24), a magnetic field measuring element(25), and a cover(26) for fixing the sensor. The sensor detects magnetic field intensity in the reaction chamber, inserted into the reaction chamber. The wire transmits a detection signal from the sensor. The magnetic field measuring element displays the magnetic field intensity from the detection signal transmitted through the wire. The cover for fixing the sensor penetrates and fixes the sensor through a groove for penetrating the sensor formed in the center, covering an upper part of the reaction chamber.
申请公布号 KR20000056320(A) 申请公布日期 2000.09.15
申请号 KR19990005534 申请日期 1999.02.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, YEONG U
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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