| 摘要 |
PROBLEM TO BE SOLVED: To realize a charged particle beam exposure system which is provided with a blanking aperture array(BAA) to enable a fine beam which passes through an aperture to be much deflected with a small voltage. SOLUTION: A charged particle beam exposure system is equipped with a BAA, which is possessed of a beam source, apertures 26, and deflecting electrodes 24 provided at each aperture 24 confronting each other and is capable of turning on and off a charged particle beam that passes through the apertures or with on/off signals applied to the deflecting electrodes provided to the apertures, a deflecting means which deflects a charged particle beam that passes through the BAA, a focusing means which focuses a charged particle beam that passes through the BAA on a specimen, and an exposure control means which controls the signals applied to the electrodes of the apertures, where the BAA is equipped with laminated BAA boards 20A, 20B, 20p-20U, and apertures are provided to each of the BAA boards 20A, 20B, 20p-20U, and deflection electrodes are formed on one surfaces of the BAA board 20A, 20B, 20p-20U. |
