发明名称 |
A CARRIER HEAD WITH A FLEXIBLE MEMBRANE FOR CHEMICAL MECHANICAL POLISHING |
摘要 |
<p>A carrier head for a chemical mechanical polishing apparatus has a base, a flexible membrane extending beneath the base to define a pressurizable chamber, a support structure positioned in the chamber, and a spacer ring positioned outside the chamber. The flexible membrane includes a lower surface of the flexible membrane providing a mounting surface for a substrate, and a perimeter portion that extends in a serpentine path between the spacer ring and the support structure.</p> |
申请公布号 |
WO0021714(A9) |
申请公布日期 |
2000.09.14 |
申请号 |
WO1999US22181 |
申请日期 |
1999.09.23 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHEN, HUNG;ZUNIGA, STEVEN |
分类号 |
B24B37/30;B24B37/32;H01L21/304;(IPC1-7):B24B37/04;B24B41/06 |
主分类号 |
B24B37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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