发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method capable of stably manufacturing the structure of a drift region in a power MOSFET. SOLUTION: In a manufacturing method a power MOSFET having, in a drift region, a columnar region group in which a columnar P-type region 15 and a columnar N-type region 16 are alternately arranged, and an N-type isolation region 17 formed adjacently to the outside of the columnar region group, P-type dopant of concentration turning to an N-type by heat treatment is added to the N-type isolation region 17, and then heat treatment is performed.
申请公布号 JP2000252297(A) 申请公布日期 2000.09.14
申请号 JP19990054768 申请日期 1999.03.02
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 EBARA KOJI;OSE HIROKI;KASAHARA HIROO
分类号 H01L29/78;H01L21/336;H01L29/06;(IPC1-7):H01L21/336 主分类号 H01L29/78
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