发明名称 ELECTRON BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent generation of an excessive thermal load in a target part and in an electron beam transmitting part of a casing in an electron beam irradiation device generating a positron by irradiation with an accelerated electron beam. SOLUTION: In this electron beam irradiation device, a disc-shaped target having an electron beam irradiation area made of a high atomic number and high melting point material is turned around an axis parallel to an electron beam. In this electron beam irradiation device, the target is constructed of a plurality of tantalum discs 60, each of which is formed of an inside disk 61 made of tantalum, 12 arcuate targets 63 made of tantalum, and an outer ring 65.
申请公布号 JP2000249800(A) 申请公布日期 2000.09.14
申请号 JP19990055499 申请日期 1999.03.03
申请人 MITSUBISHI HEAVY IND LTD 发明人 HIROTA KOICHI;HAYANO MUTSUHIKO
分类号 G21K5/08;(IPC1-7):G21K5/08 主分类号 G21K5/08
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