| 摘要 |
PROBLEM TO BE SOLVED: To provide a practical mark detection method in a case where a projection optical system is equipped with a prescribed reflection member. SOLUTION: This mark detection method is carried out in a manner where exposure light IL penetrating through a reticle 3 forms a primary image I passing through lenses L11 to L24, and furthermore the image of a pattern on the reticle 3 is formed on a water W through the aperture 36 and lens component L2 of a primary mirror M1, an auxiliary mirror M2 on the rear of the lens component L2, the lens component L2, the reflecting surface R1 of the primary mirror M1, the lens component L2, and the aperture 37 of the auxiliary mirror M2. A projection optical system PL is composed of a lens L11 to the lens component L2 equipped with the auxiliary mirror M2. A wafer mark on the wafer is irradiated with an alignment light AL through a light sending mirror 32 arranged adjacent to a primary image I, the aperture 36 of the primary mirror M1, and the aperture 37 of the auxiliary mirror M, and a return light from the wafer mark is detected via the apertures 37 and 36, and the light receiving mirror 33 arranged adjacent to the primary image I.
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