| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a surface treatment device, capable of performing a surface treatment causing small dispersion in a surface within a relatively short time, with a relatively small quantity of a treatment agent, when the surface treatment is performed by supplying the treatment agent in a gas stage to the treated substrate as a surface treatment method of surface energy adjustment, and provide an electron emission element having satisfactory electron emission characteristic, an electron source having high uniformity, an image formation device having high uniformity and satisfactory display quality, and their manufacturing methods capable of manufacturing them with a high yield. SOLUTION: This surface treatment device is performed, by supplying a treatment agent 1205 in a gas state to a treated substrate 1201 arranged in a treatment vessel 1202. In this case, the treatment agent 1205 having a specific gravity larger than that of the air is supplied into the treatment vessel 1202, and a substrate outlet 1203 is formed above the substrate arranging position of the treatment vessel 1202.</p> |
