发明名称 |
MANUFACTURE OF ATMOSPHERIC PRESSURE-RESISTANT SUPPORT STRUCTURE FOR ELECTRON BEAM DEVICE, ATMOSPHERIC PRESSURE-RESISTANT SUPPORT STRUCTURE FOR ELECTRON BEAM DEVICE AND ELECTRON BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To easily and stably carry out smoothing at a high yield ratio in the case where smoothing a cut surface of an atmospheric pressure-resistant support structure prepared by a cutting machining is carried out in order to prevent a break of the atmospheric pressure-resistant support structure and a surface discharge on a surface of the atmospheric pressure-resistant supporting structure when a wall of an air tight container is supported by the atmospheric pressure-resistant supporting structure in the air tight container of an electron beam device. SOLUTION: An insulation substrata 1, i.e., a spacer supporting a wall of an air tight container accommodating an electron releasing element is prepared by cutting a mother material. A fine projection and a fine chip generated on a cut surface 1a by a cutting machining are made to a smooth shape by annealing carried out by heating the cut surface 1a of the insulation substrate 1 at a higher temperature than a softening point of a constitution material of the insulation substrate 1. Break of the insulation substrate caused by a concentration of a stress to the chip of the insulation plate 1 and a concentration of an electric field to the projection and the chip are prevented.
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申请公布号 |
JP2000251705(A) |
申请公布日期 |
2000.09.14 |
申请号 |
JP19990046694 |
申请日期 |
1999.02.24 |
申请人 |
CANON INC |
发明人 |
HIROIKE TARO;FUSHIMI MASAHIRO;ITO YASUHIRO |
分类号 |
H01J9/24;H01J5/03;H01J29/87;H01J31/12;(IPC1-7):H01J9/24 |
主分类号 |
H01J9/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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