发明名称 ELECTRON SOURCE FOR ELECTRON BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron source preventing wavy deflection in an extraction electrode due to uneven thermal input from a filament. SOLUTION: This electron beam irradiation device is provided with an electron source 8a generating electron beams 22. In the structure of the electron source 8a, U-shaped cross section reinforcing members 34, 36 are individually arranged along supports 14, 16 for the extraction electrode 12 so as to be fixed to the respective supports 14, 16, while the upper parts of the both reinforcing members 34, 36 are connected together by a connecting member 38, and a plurality of filaments 10 are positioned between the connecting member 38 and the extraction electrode 12.
申请公布号 JP2000249799(A) 申请公布日期 2000.09.14
申请号 JP19990052982 申请日期 1999.03.01
申请人 NISSIN HIGH VOLTAGE CO LTD 发明人 KATO KENJI;NISHIKIMI TOSHIRO
分类号 H01J37/06;G21K5/04;(IPC1-7):G21K5/04 主分类号 H01J37/06
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