| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a uniform surface conduction type electron emission element by easily forming a uniform element electrode or electron emission element film having a large area at a low cost, an electron source substrate and an image formation device having it, and manufacturing methods of them. SOLUTION: In this manufacturing method and device of an electron source substrate, having a process for spouting a droplet 12 of a metal containing solution to apply it to a substrate 1, at least the droplets 12 are spouted from plural spouting nozzles 9 formed in a spouting head 7, the relative position between the spouting head 7 and the substrate 1 is controlled, the droplets 12 are applied to the surface of the substrate 1 from the plural spouting nozzles 9, while at least either the spouting head 7 or the substrate 1 is relatively moved, the process (mechanism) for applying the droplets 12 to the surface of the substrate 1 at least measures the application position of the droplets 12 spouted from the plural spouting nozzles 9 and applied to the surface of the substrate 1, calculates the deviation amount of the measured application position from the targeted application position for each one of the respective nozzles 9, and corrects are deviation amount by controlling the relative position of the spouting head 7 and the substrate 1, based on the calculated deviation amount.</p> |
