发明名称 PHOTORESIST REMOVER COMPOSITION AND METHOD FOR USING SAME
摘要 PROBLEM TO BE SOLVED: To obtain a photoresist remover composition having high removing power because of enhanced alkalinity and capable of inhibiting the corrosion of A1 wiring without reducing the removing power even under high alkali conditions by using an alkylamine or an alkanolamine, a polar organic solvent, water and a metal-free borate as essential components. SOLUTION: The photoresist remover composition contains an alkylamine or an alkanolamine, a polar organic solvent, water and a metal-free borate as essential components or contains the salt of an alkanolamine of the formula and boric acid in a mixture of an alkylamine or an alkanolamine, a polar organic solvent and water. In the formula, R1 is H, 1-6C alkyl or 1-6C hydroxyalkyl, R2 is 2-6C alkyl or 1-6C hydroxyalkyl and R3 is 2-6C hydroxyalkyl.
申请公布号 JP2000250231(A) 申请公布日期 2000.09.14
申请号 JP19990055180 申请日期 1999.03.03
申请人 NAGASE DENSHI KAGAKU KK 发明人 TAKEI MIZUKI;NISHIJIMA YOSHITAKA;KOTANI TAKESHI
分类号 H01L21/027;G03F7/42;(IPC1-7):G03F7/42 主分类号 H01L21/027
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