| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holding device suited for reducing dispersion of ion implantation requirements at each point on a substrate surface. SOLUTION: A process target substrate is held on the holding face of a pedestal 12. A revolving mechanism causes the pedestal 12 to revolve along a circular orbit around a revolution shaft 11. During a process period, from when the pedestal 12 approaches a processing region on this circular orbit to when is separates away from the process region, a rotation mechanism causes the pedestal 12 to rotate in the opposite direction of the revolution direction, so that the holding face of the pedestal translationally moves along the circular orbit. |
