发明名称 PLATE MAKING METHOD FOR PHOTOSENSITIVE RESIN PLATE AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To make it possible to eliminate the need for the work for cutting away register marks before printing and to embody higher productivity and a lower plate production cost by forming the register marks for plate alignment of the height lower than the plate height on a base of a photosensitive resin plate by irradiation with active rays via a masking film. SOLUTION: The register marks for plate alignment of the height lower than the plate height are formed on the base of the photosensitive resin plate by irradiation with the active rays via the masking film drawn with a plurality of the register marks for alignment. In this plate making method, a negative film 2 is aligned by aligning and fitting holes to the fixing pins on a lower transparent substrate 1. The photosensitive resin and base film are laminated thereon and further the masking film 8 is superposed. The plural pins existing in the upper part of the photosensitive resin layer and the holes of the masking film 8 are aligned and fitted, by which the negative film 2 and the masking film 8 are so aligned that both images thereof are aligned.
申请公布号 JP2000250225(A) 申请公布日期 2000.09.14
申请号 JP19990052307 申请日期 1999.03.01
申请人 ASAHI CHEM IND CO LTD 发明人 KAWATSUJI SHINICHI
分类号 B41C1/10;G03F7/20;G03F9/00;(IPC1-7):G03F7/20 主分类号 B41C1/10
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