| 摘要 |
<p>A hard mask (105) consisting of SiCN is formed on a fluorine-added carbon film (103) to thereby improve adhesiveness between the fluorine-added carbon film (103) and the hard mask (105) and prevent separation. In addition, the hard mask (105) consisting of SiCN can have a larger selection ratio, and a smaller permittivity than one consisting of SiN or SiC.</p> |
