| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device by which an image is accurately recorded with high resolution by effectively radiating light from a light source to a rectangular light radiation area. SOLUTION: This device executes pattern exposure for the thin film of a photosensitive material formed on the surface of a base plate 18 by radiating the light to a rectangular base plate 18 through a photomask 17 having a rectangular pattern area, and is provided with the light sources 12a and 12b and elliptic mirrors 13a and 13b respectively making a pair, a turn-back mirror 14, a compound lens 6 and a pair of collimating mirrors 15 and 16. The light transmitted through the compound lens 6 is converted into parallel light by the collimating function of the collimating mirrors 15 and 16 and is radiated to the photomask 17. |
