| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner and a lithography system which can be lessened in necessary floor area. SOLUTION: A laser device 14 is arranged in a region of a floor surface F, which is sufficiently large in width to include a maintenance area located on each side of an exposure system main body 12 constituted in an aligner. The maintenance areas of the aligner main body 12 and the laser device 14 are so arranged in a floor surface F as to overlap partially with each other to be partially used in common. Therefore, extension part of the laser device 14 extending from a maintenance area located on each side of the exposure system main body 12 can be eliminated, so that the necessary floor space can be lessened. A necessary floor area can be made smaller than that in a case where the maintenance areas of the laser device 14 and the exposure system main body 12 are separately provided.
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