RESIST REMOVER AND PRODUCTION OF SEMICONDUCTOR DEVICE USING SAME

摘要

PROBLEM TO BE SOLVED: To obtain a resist remover capable of easily removing a resist applied on an inorganic substrate and capable of producing high precision circuit wiring without corroding the inorganic substrate of various materials in the removal of the resist by using an alkanolamine having a specified structure. SOLUTION: The resist remover comprises an alkanolamine having one or more structures of the formula in one molecule. In the formula, R1 and R2 are each H, 1-8C alkyl or alkylene. The alkanolamine is, e.g. an aliphatic alkanolamine or an alkanol aliphatic polyamine. In the production of a semiconductor device, a resist film is etched and the residual resist film and/or the resist residue is removed using the resist remover. Ashing may be carried out before the removal.