| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrostatic chuck by which uniform electrostatic attraction can be performed. SOLUTION: In this electrostatic chuck, a dielectric layer plate 1 whose grain boundary component is a yttrium oxide aluminum phase and which is composed of an AlN sintered compact and a plate 5 for a base are bonded by a bonding agent layer 7 which is composed mainly of AlN and yttrium oxide aluminum while an electrode 3 is interposed. Then, the flatness of the attraction face 1a of the dielectric layer plate is at 20 μm or lower, and the difference between the maximum value and the minimum value of the interval between the attraction face 1a and the electrode 3 is at 50 μm or lower. |
