Polishing apparatus including attitude controller for turntable and/or wafer carrier

摘要

There is provided a polishing apparatus comprising an attitude controller for controlling an attitude or orientation of a turntable having a polishing surface and/or a carrier for holding an article to be polished in a sliding contact relation with the polishing surface. The turntable and carrier are connected to their drive shafts through universal joints. The attitude controllers controls angles of tilting of the turntable and the carrier relative to their drive shafts.