发明名称 Semiconductor integrated circuit capable of preventing breakdown of a gate oxide film
摘要 The present invention provides a semiconductor integrated circuit comprising a plurality of logic circuits, each of which has at least a first field effect transistor with a first gate connected to a high voltage line and at least a second field effect transistor with a second gate connected to a ground line, wherein said first gates of said plurality of logic circuits are commonly connected through a first interconnection structure to a first resistance which is connected to said high voltage line and wherein said second gates of said plurality of logic circuits are also commonly connected through a second interconnection structure to a second resistance which is connected to said ground line. The first and second interconnection structures enable the single first resistance and the single second resistance to prevent the gate breakdown of the gates in the plurality of the logic circuits. The semiconductor integrated circuit needs a small area for placement of only the two resistances or the first and second resistances in order to prevent the breakdown of the gates of all of the plural logic circuits.
申请公布号 US6118305(A) 申请公布日期 2000.09.12
申请号 US19970927811 申请日期 1997.09.12
申请人 NEC CORPORATION 发明人 EGAWA, KUMI
分类号 H01L27/04;H01L21/822;H01L21/8234;H01L27/06;H01L27/088;(IPC1-7):H03K19/094 主分类号 H01L27/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利