发明名称 Adjustable low profile gimbal system for chemical mechanical polishing
摘要 A low profile gimbal system is provided to greatly reduce the generation of moments about a pivot point of the gimbal system during polishing processes. The gimbal system is adjustable so that a preferred balance between stiffness and friction may be selected as appropriate for a variety of different polishing conditions. A locking feature ensures that the adjustment setting is maintained during polishing.
申请公布号 US6116990(A) 申请公布日期 2000.09.12
申请号 US19990247769 申请日期 1999.02.09
申请人 APPLIED MATERIALS, INC. 发明人 SINCLAIR, JAMES;TROJAN, DANIEL R.;LEE, LAWRENCE L.
分类号 B24B37/04;B24B41/047;(IPC1-7):B24B5/02;F16C25/04 主分类号 B24B37/04
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