发明名称 |
Adjustable low profile gimbal system for chemical mechanical polishing |
摘要 |
A low profile gimbal system is provided to greatly reduce the generation of moments about a pivot point of the gimbal system during polishing processes. The gimbal system is adjustable so that a preferred balance between stiffness and friction may be selected as appropriate for a variety of different polishing conditions. A locking feature ensures that the adjustment setting is maintained during polishing.
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申请公布号 |
US6116990(A) |
申请公布日期 |
2000.09.12 |
申请号 |
US19990247769 |
申请日期 |
1999.02.09 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SINCLAIR, JAMES;TROJAN, DANIEL R.;LEE, LAWRENCE L. |
分类号 |
B24B37/04;B24B41/047;(IPC1-7):B24B5/02;F16C25/04 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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