| 摘要 |
PROBLEM TO BE SOLVED: To provide a susceptor manufacturing method in which no deflection is generated in the susceptor after its surface is coated, and a substrate processing device using the susceptor by the method. SOLUTION: In the case of coating the surface of a susceptor, a susceptor 10 in a processing chamber is supported perpendicular by support pins 11, 12, 13, and held by fall-preventive pins 21, 22 across the susceptor so that the susceptor is not fallen toward the main surface side. Thus, the self-weight of the susceptor is not loaded perpendicular to the main surface of the susceptor, but loaded in the extending direction of the main surface of the susceptor, and the susceptor is not deflected by its self-weight, and the susceptor excellent in flatness is manufactured. A film uniform in film thickness and resistivity can be formed on a wafer without generating any slip in the wafer held by the susceptor by using the susceptor excellent in flatness in a substrate processing device.
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