发明名称 Exposure apparatus
摘要 An exposure apparatus to expose a photo-sensitive layer formed on a substrate of a recording media is disclosed which comprises an exposure light source; a first means of focusing a light from the light source; an acousto-optic modulator disposed off the focal plane of the first focusing means to modulate the light focused by the first focusing means according to a signal to be recorded; and a second means of focusing the light modulated by the acousto-optic modulator onto the photo-sensitive layer formed on the substrate of the recording media.
申请公布号 US6118574(A) 申请公布日期 2000.09.12
申请号 US19980059259 申请日期 1998.04.14
申请人 SONY CORPORATION 发明人 IMANISHI, SHINGO;MASUHARA, SHIN;YAMATSU, HISAYUKI;KASHIWAGI, TOSHIYUKI
分类号 G11B7/135;G02F1/33;G03F7/20;G11B7/26;(IPC1-7):G02F1/33;G11B7/00;G11B7/003 主分类号 G11B7/135
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