发明名称 |
APPARATUS AND METHOD FOR GROWING SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for growing a single crystal under gripping the enlarged-diameter portion of the single crystal formed by CZ method, intended to grow and pull it in dislocation-free and stable state without causing its deformation or rupture even if the enlarged-diameter portion stands at high temperatures and the corresponding single crystal rod has a weight of as heavy as about 400 kg with large diameter. SOLUTION: This method for growing a single crystal comprises ensuring the enlarged-diameter portion of the single crystal to be gripped at its high temperatures with heavy weight by controlling the temperature T( deg.C) of the enlarged-diameter portion so as to satisfy the relationship: W<=-(4/3)T+1,270 (W is the weight of the single crystal held under seizure: kg) within the range of the temperature T from 500 to 800 deg.C when the minimum diameter of the neck on the lower part of the enlarged-diameter portion is brought to >=12 mm under the conditions that a site where a gripping member is contacted with the lower part of the enlarged-diameter portion is disposed with a contact member of a material with a surface hardness of >=70 in Shore hardness and <=100 in Vickers hardness and tensile strength of >=400 MPa. |
申请公布号 |
JP2000247786(A) |
申请公布日期 |
2000.09.12 |
申请号 |
JP19990047033 |
申请日期 |
1999.02.24 |
申请人 |
SUPER SILICON KENKYUSHO:KK |
发明人 |
YAMAGISHI HIROTOSHI |
分类号 |
C30B15/22;C30B15/30;C30B29/06;(IPC1-7):C30B29/06 |
主分类号 |
C30B15/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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