发明名称 APPARATUS AND METHOD FOR GROWING SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for growing a single crystal under gripping the enlarged-diameter portion of the single crystal formed by CZ method, intended to grow and pull it in dislocation-free and stable state without causing its deformation or rupture even if the enlarged-diameter portion stands at high temperatures and the corresponding single crystal rod has a weight of as heavy as about 400 kg with large diameter. SOLUTION: This method for growing a single crystal comprises ensuring the enlarged-diameter portion of the single crystal to be gripped at its high temperatures with heavy weight by controlling the temperature T( deg.C) of the enlarged-diameter portion so as to satisfy the relationship: W<=-(4/3)T+1,270 (W is the weight of the single crystal held under seizure: kg) within the range of the temperature T from 500 to 800 deg.C when the minimum diameter of the neck on the lower part of the enlarged-diameter portion is brought to >=12 mm under the conditions that a site where a gripping member is contacted with the lower part of the enlarged-diameter portion is disposed with a contact member of a material with a surface hardness of >=70 in Shore hardness and <=100 in Vickers hardness and tensile strength of >=400 MPa.
申请公布号 JP2000247786(A) 申请公布日期 2000.09.12
申请号 JP19990047033 申请日期 1999.02.24
申请人 SUPER SILICON KENKYUSHO:KK 发明人 YAMAGISHI HIROTOSHI
分类号 C30B15/22;C30B15/30;C30B29/06;(IPC1-7):C30B29/06 主分类号 C30B15/22
代理机构 代理人
主权项
地址