发明名称 SURFACE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment device in which stabilized surface treatment can constantly be performed without being influenced by variations in atmospheric humidity by controlling ozone concentration in a treating chamber or the illuminance of ultraviolet radiation of 300 nm or shorter. SOLUTION: A treatment chamber 12 in a treatment device body in which ultraviolet radiation light sources 16 are fitted is provided with an air introducing part 20 for introducing air into the treatment chamber and an oxygen feeding part 21 for introducing oxygen into the treatment chamber, and an ozone concentration meter 30 for measuring ozone concentration in the treatment chamber is arranged. Using the output of the ozone concentration meter, the oxygen feed quantity in the treatment chamber is controlled to always keep the ozone concentration in the treatment chamber constant. Instead of the ozone concentration meter, an ultraviolet radiation illuminance meter may be arranged to keep fixed the ozone concentration in the treatment chamber constant similarly.
申请公布号 JP2000246200(A) 申请公布日期 2000.09.12
申请号 JP19990051431 申请日期 1999.02.26
申请人 IWASAKI ELECTRIC CO LTD 发明人 SAKAI KAZUHIRO
分类号 B08B7/00;B01J19/12;C01B13/10;C08J7/00;(IPC1-7):B08B7/00 主分类号 B08B7/00
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