发明名称 SUBSTRATE SURFACE TREATING DEVICE AND METHOD, SURFACE CONDUCTING TYPE ELECTRON SOURCE SUBSTRATE, AND IMAGE FORMING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To apply uniform surface treatment for even a substrate of large size on which a lot of projecting and recessing parts are formed by making a treating liquid applying means have a nozzle line for applying it to all the surface to be treated and arraying a moving means for moving a substrate for blowing an air current to the surface to be treated from air knives in a treating liquid removing chamber. SOLUTION: A substrate surface treating device consists of a treating chamber 28 and a treating liquid removal chamber 92. A conveying roller 12 as a substrate conveying means for supporting and conveying a substrate 1 and plural nozzles 13 in the treating chamber 28 are arranged. The width of the nozzle line is preferably made almost equal to that of the substrate 1 and air knives 15 are installed in a treating liquid removing chamber 92. And the substrate 1 on the conveying roller 12 is conveyed to the treating chamber 28 in the direction of the arrow 51. By the nozzles 13, the treating liquid is applied, and the dripped treating liquid is recovered in a recovery tank 30. The substrate 1 to which the treating liquid has been applied is conveyed to the treating liquid removing chamber 92 by the conveying roller 12 to pass between the air knives 15. At this time, the unreacted and remaining treating liquid is removed.</p>
申请公布号 JP2000246191(A) 申请公布日期 2000.09.12
申请号 JP19990050678 申请日期 1999.02.26
申请人 CANON INC 发明人 KOJIMA MAKOTO
分类号 B08B3/02;B08B3/10;C09K3/18;H01J9/02;H01J9/38;(IPC1-7):B08B3/02 主分类号 B08B3/02
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