发明名称 Single source thermal ablation method for depositing organic-inorganic hybrid films
摘要 In order to form a film of organic-inorganic hybrid material, such as a perovskite material, in a selected stoichiometric ratio upon a surface of a substrate, the proposed method entails a number of simple steps. First, a substrate and a selected quantity of an organic-inorganic hybrid material are placed in a chamber, with the hybrid material being placed on a heater. Then, the hybrid material is heated sufficiently, as by passing an electric current through the heater, to cause its total ablation. As a consequence, a film of the organic-inorganic hybrid material, in the aforesaid selected stoichiometric ratio, reassembles as a film upon a surface of the substrate. During the heating step, the chamber may be either evacuated to a pressure below 10-3 torr or filled with an inert gas, such as nitrogen.
申请公布号 US6117498(A) 申请公布日期 2000.09.12
申请号 US19980192130 申请日期 1998.11.13
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHONDROUDIS, KONSTANTINOS;MITZI, DAVID BRIAN;PRIKAS, MICHAEL TONY
分类号 C23C14/12;C23C14/26;(IPC1-7):C23C8/54 主分类号 C23C14/12
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