| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a grinding composition that can grind metallic materials, for example, metallic tantalum or tantalum nitride at a high grinding rate. SOLUTION: In the grinding method of metallic materials, for example, metallic tantalum or tantalum nitride, a grinding composition that includes abrasive grains of silicon oxide, an oxidant consisting of hydrogen peroxide, and at least one carbonate salt selected from sodium carbonate, potassium carbonate, ammonium carbonate and ammonium hydrogen carbonate, and the balance water is employed.</p> |
